RADIATION-CROSSLINKABLE MIXTURE AND METHOD FOR USING THE MIXTURE IN FORMATION OF RELIEF STRUCTURE STABLE AT HIGH TEMPERATURE

Title:

RADIATION-CROSSLINKABLE MIXTURE AND METHOD FOR USING THE MIXTURE IN FORMATION OF RELIEF STRUCTURE STABLE AT HIGH TEMPERATURE

Document Type and Number:

Japanese Patent JPH0651510

Kind Code:

A

Abstract:

PURPOSE: To provide a relief structure capable of easy reproduction and having desirable bending strength and buckling resistance by giving a photoresist based on a soluble precursor or polyamide, polyisoindolequinazolinedione, polyaroylenebenzimidazole or other heterocyclic polymer.

CONSTITUTION: This radiation-crosslinkable mixture fit to form a relief structure stable at high temp. consists essentially of a precursor of a polymer having at least one carboxyl group and soluble in a polar org. solvent, a copolymerizable ethylenic unsatd. tert. sulfonium salt, a photoinitiator or a photoinitiator compsn. and at least one kind of polar neutral org. solvent. The polymer is a heterocyclic polymer stable at high temp.

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Inventors:

HANSUUYOOAHIMU HEENRE
MANFUREETO SHIYUBUARUTSU
RAINAA BURUMU

Application Number:

JP12626093A

Publication Date:

February 25, 1994

Filing Date:

May 27, 1993

Export Citation:

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Assignee:

BASF LACKE & FARBEN

International Classes:

G03F7/027; G03F7/028; G03F7/037; H01L21/027; C08G73/10; (IPC1-7): G03F7/027; C08G73/10; G03F7/028; H01L21/027

Attorney, Agent or Firm:

Tajiro Taiji

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