Title:
RADIATION CURABLE AQUEOUS COMPOSITION
Document Type and Number:
Japanese Patent JP2013082930
Kind Code:
A
Abstract:
To provide homogeneous, monomer and solvent free, UV/EB curable aqueous formulations which provide high solvent resistance and have insignificant odor and/or low levels of extractable components.
There is provided a method for producing a solvent resistant, low-extractable, film from an actinic radiation curable homogenous aqueous composition containing a water soluble compound, having at least one alpha, beta-ethylenically unsaturated radiation polymerizable double bond, and water as essential components.
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| WO/2002/046243 | POLYMERIZATION PROCESS |
Inventors:
CHATTERJEE SUBHANKAR
LAKSIN MIKHAIL
BIRO DAVID
TURGIS JEAN DOMINIQUE
LAKSIN MIKHAIL
BIRO DAVID
TURGIS JEAN DOMINIQUE
Application Number:
JP2012273149A
Publication Date:
May 09, 2013
Filing Date:
December 14, 2012
Export Citation:
Assignee:
SUN CHEMICAL CORP
International Classes:
C08F2/00; C08F283/00; C08F290/06; C08F291/00; C09D11/10; G03F7/004; G03F7/027; G03F7/038
Domestic Patent References:
| JP2003147230A | 2003-05-21 | |||
| JP2002346473A | 2002-12-03 | |||
| JPS4866186A | 1973-09-11 | |||
| JP2000248023A | 2000-09-12 | |||
| JPH10219158A | 1998-08-18 | |||
| JPH10316940A | 1998-12-02 | |||
| JP2002187918A | 2002-07-05 |
Attorney, Agent or Firm:
Hisashi Tsuji
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