Title:
複数の放射供給源を有した放射装置およびプラズマ装置
Document Type and Number:
Japanese Patent JP5209174
Kind Code:
B2
Abstract:
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A passive plasma catalyst may include, for example, any object capable of inducing a plasma by deforming a local electric field. An active plasma catalyst can include any particle or high energy wave packet capable of transferring a sufficient amount of energy to a gaseous atom or molecule to remove at least one electron from the gaseous atom or molecule, in the presence of electromagnetic radiation.
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Inventors:
Kumar, Satyandra
Kumar, Devendra
Kumar, Devendra
Application Number:
JP2004504585A
Publication Date:
June 12, 2013
Filing Date:
May 07, 2003
Export Citation:
Assignee:
Beatty International, Inc.
International Classes:
B01J7/00; H05H1/24; A62D3/00; B01D53/86; B01D53/92; B01J19/08; B01J19/12; B01J37/34; B22F3/105; C01B3/02; C21D1/06; C21D1/09; C21D1/38; F01N3/08; F01N3/10; F01N3/20; F01N3/24; F01N3/28; F01N3/30; F01N9/00; F27B17/00; F27D3/12; F27D11/08; F27D11/12; G21K5/00; H01J37/32; H01M8/06; H05B6/68; H05B6/78; H05B6/80; H05H1/46; C22B4/00; F01N13/10
Domestic Patent References:
| JP10284296A | ||||
| JP4070136U | ||||
| JP4144992A | ||||
| JP9115694A | ||||
| JP3291243A | ||||
| JP2001257097A | ||||
| JP10125662A |
Foreign References:
| US5828338 |
Attorney, Agent or Firm:
Yusuke Hiraki
Sekiya Mitsuo
Toshiaki Watanabe
Sekiya Mitsuo
Toshiaki Watanabe