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Title:
RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER
Document Type and Number:
Japanese Patent JP2000221675
Kind Code:
A
Abstract:

To obtain the radiation-sensitive composition for the color filter high in film hardness, that the pixel patter is prevented from occurrence of damage and the like due to brushing and the like after development and the pixel superior in adhesion to a substrate and a light shielding layer and surface lubricity is obtained by incorporating a colorant and the like and a photopolymerization initiator containing a specified compound.

The radiation-sensitive composition contains the colorant, a polyfunctional monomer, and the photopolymerization initiator containing the traizine compound represented by the formula and the triazine compound enhances cross-linking density and film hardness at the time of exposing the radiation-sensitive composition to harden it. This photopolymerization initiator contains, further, the biimidazole derivative made of 2,2'-bis-(2,4- dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, that function as a hydrogen donor.


Inventors:
SAKURAI KOICHI
AOYAMA SATOKO
YOSHIDA KOICHIRO
WATANABE TAKESHI
Application Number:
JP2377299A
Publication Date:
August 11, 2000
Filing Date:
February 01, 1999
Export Citation:
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Assignee:
JSR CORP
International Classes:
C07D405/04; C08L101/12; G02B5/20; G03F7/004; G03F7/029; (IPC1-7): G03F7/029; C07D405/04; C08L101/12; G02B5/20; G03F7/004
Attorney, Agent or Firm:
Toshiaki Fukuzawa