RADIATION-SENSITIVE COMPOSITION FOR COLOR FILTER

Japanese Patent JP3661399

B2

PROBLEM TO BE SOLVED: To provide an innovative radiation-sensitive composition for a color filter which can provide excellent developing property even in the case pigments are mixed in high concentration and excellent pixels with high adhesion strength to a substrate and a light shielding layer and causes no residue and surface contamination on non-radiated parts of the substrate and the light shielding layer at the time of development.
SOLUTION: This radiation-sensitive composition for a color filter consists of (A) coloring agents, (B) an alkali-soluble resin containing copolymer of a monomer having a defined formula and another copolymerizable monomer, (C) a multi-functional monomer, and (D) a photo polymerization initiator. In the formula, R stands for hydrogen atom or methyl group; m for an integer from 1 to 10; and n for an integer from 1 to 4.

WO/2018/139534	COMPOSITION, FILM, INFRARED-TRANSMITTING FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND INFRARED SENSOR
JPWO2005116763	Graft pattern forming method, graft pattern material, lithography method, conductive pattern forming method, conductive pattern, color filter manufacturing method, color filter, and microlens manufacturing method.
JP5456183	A black curable composition, a light-shielding color filter for a solid-state image sensor and a method for manufacturing the same, and a solid-state image sensor.

Takahiro Iijima
Yukiko Ito
Koichi Sakurai
Hiroaki Nemoto

JP7646098A

June 15, 2005

March 11, 1998

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JSR CORPORATION

G03F7/004; C08F2/50; C09D4/02; G02B5/20; G03F7/027; (IPC1-7): G02B5/20; C08F2/50; G03F7/004; G03F7/027

JP10031308A
JP8262221A
JP9179299A
JP11149010A

Toshiaki Fukuzawa

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