RADIATION-SENSITIVE COMPOSITION AND METHOD FOR MANUFACTURING LOW-MOLECULAR-WEIGHT COMPOUND FOR USE THEREIN

Title:

RADIATION-SENSITIVE COMPOSITION AND METHOD FOR MANUFACTURING LOW-MOLECULAR-WEIGHT COMPOUND FOR USE THEREIN

Document Type and Number:

Japanese Patent JP2013145384

Kind Code:

A

Abstract:

To provide a radiation-sensitive composition satisfying high sensitivity, high resolution, good pattern form, and good line edge roughness at the same time.

A radiation-sensitive composition comprises: (A) a low-molecular-weight compound having, per molecule, one or more acid-dissociable groups which decompose by action of acid to enhance solubility in alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate the acid by irradiation with actinic rays or a radiation and having a number-average molecular weight (Mn) of 500 to 4,000 expressed in terms of polystyrene measured by gel permeation chromatography (GPC); and (B) a solvent. The low-molecular-weight compound (A) is a compound shown by the following formula (1).

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Inventors:

MATSUMURA SHINJI
SHIMIZU DAISUKE
KAI TOSHIYUKI

Application Number:

JP2013029533A

Publication Date:

July 25, 2013

Filing Date:

February 18, 2013

Export Citation:

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