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Title:
RADIATION-SENSITIVE EMULSION
Document Type and Number:
Japanese Patent JPH07287333
Kind Code:
A
Abstract:

PURPOSE: To obtain a photographic emulsion contg. grains which intensity the photographic sensitivity of the photographio emulsion and have {100} crystal faces having the improved photographic sensitivity by specifying the constitution of site directors, etc.

CONSTITUTION: The site directors are adsorbed on the {100} crystal faces, and 0.5 to 50mol% of the total quantity of the silver, forming the face-centered cubic crystal structure of the grains, exists in the intersected parts of the {100} crystal faces to form projections. The silver halide, forming these projections, exhibits solubility at least equal to the solubility of the silver halide, forming the {100} crystal faces. Further, the structures of the site directors satisfy the formula. In the formula, R2 is hydrogen or an arbitrarily substd. hydrocarbon; R5 is an electron withdrawing substituent; R6 is hydrogen, alkyl or an electron withdrawing group; Q is a quaternary substituent; X is a charge balance paired ion; n is 0 or 1.


Inventors:
SHIN UEN
Application Number:
JP11023195A
Publication Date:
October 31, 1995
Filing Date:
April 12, 1995
Export Citation:
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Assignee:
EASTMAN KODAK CO
International Classes:
G03C1/035; G03C1/07; G03C1/015; (IPC1-7): G03C1/035; G03C1/015; G03C1/07
Attorney, Agent or Firm:
Takashi Ishida (3 others)