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Title:
RADIATION SENSITIVE RESIN COMPOSITION TO BE USED FOR FORMATION OF SPACER BY INK JET METHOD, SPACER AND LIQUID CRYSTAL DISPLAY ELEMENT
Document Type and Number:
Japanese Patent JP2003302642
Kind Code:
A
Abstract:

To provide a spacer composition optimized for the manufacture of a spacer by a low-cost ink jet method and to provide a spacer formed from the composition and a liquid crystal display element equipped with the spacer.

The composition comprises: [A] a copolymer of (a1) an unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, (a2) an epoxy group-containing unsaturated compound and (a3) an olefin unsaturated compound except for compounds of (a1) and (a2); [B] a polymerizable compound having an ethylenic unsaturated bond; [C] a radiation sensitive polymerization initiator; and [D] a solvent having ≥180°C boiling point at normal pressure. The spacer is formed from the above composition, and the liquid crystal display element has the above spacer.


Inventors:
NISHIO HISAHIRO
NIWA KAZUAKI
Application Number:
JP2002107808A
Publication Date:
October 24, 2003
Filing Date:
April 10, 2002
Export Citation:
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Assignee:
JSR CORP
International Classes:
B41J2/01; C08F2/44; C08F291/00; G02F1/1339; G03F7/033; (IPC1-7): G02F1/1339; B41J2/01; C08F2/44; C08F291/00; G03F7/033