PURPOSE: To form a fine negative pattern by excimer laser or the like with high sensitivity and high resolution by containing a copolymer having a specific repeating unit and a repeating unit containing sulfonic group or the like.
CONSTITUTION: The copolymer having the repeating unit expressed by a formula and the repeating unit containing sulfonic group and/or carboxylic group is contained. In the formula, R1 is hydrogen atom, methyl group or haloalkyl group, R2 is haloalkyl group, (n) is integer 1-3. Furthermore, in the formula, fluorine atom, chlorine atom, bromine atom and iodine atom is used as halogen atom contained in R1 or of R2 and the preferable halogen atom is chlorine atom. And 1-4C alkyl group, preferably methyl group is used as alkyl group constituting haloalkyl group in R1 or of R2. The repeating unit expressed by the formula is either one kind or is in the coexistence of two or more kinds.
KOBAYASHI YASUTAKA
ISAMOTO YOSHITSUGU
MIURA TAKAO
