PURPOSE: To provide a radiation sensitive resin compound, which presents excel lent developing performance, pattern configuration, resolution, adhesiveness, focusing tolerance, and film remaining, ensures good stability, and can serve favorably for irradiation with radiations of wavelength under far-infrared ray, for example, excimer laser.
CONSTITUTION: A radiation sensitive resin compound comprises a positive type radiation sensitive resin compound and a negative type radiation sensitive resin compound, wherein the former is composed of an alkaline soluble resin (1), radiation sensitive acid forming agent (2), a compound (3) having a nature of controlling the alkaline solubility of the alkaline soluble resin (1) and exhibiting a nature of diminishing or nullifying the alkaline solubility control effect of the resin (1) upon being dissolved under existence of acids or of accelerating the alkaline solubility of the resin (1) and (4): a nitrogen-including basic compound; and the latter composed of the same items: (1), (2), (4), and a compound (3) which is of nature as cross-linkeying the alkaline soluble resin (1) under existence of acids.
OTA TOSHIYUKI
ISAMOTO YOSHITSUGU
MIURA TAKAO
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