Title:
RAW MATERIAL FOR HIGH OXYGEN CHROMIUM TARGET AND ITS MANUFACTURE
Document Type and Number:
Japanese Patent JP3450370
Kind Code:
B2
Abstract:
PURPOSE: To provide a raw material for high oxygen chromium target having oxygen-containing form, by which dusting phenomenon at the time of coating film by sputtering can effectively be prevented.
CONSTITUTION: This raw material for high oxygen chromium target disperses chromium oxide crystal grains in metallic chromium in the condition of bringing at least a part of the surface of the whole crystal constituting this oxide crystal grains into contact with the matrix of the metallic chromium. Then, as the manufacturing method of this raw material, by executing heat treatment to the metallic chromium containing oxygen in solid solution or oxide crystal, or a material obtained by adding chromium oxide thereto the oxygen, oxide crystal and crystal of chromium oxide powder are precipitated or crystal-grown into chromium oxide crystal grains having 0.1-100μm grain diameter to make the raw material for chromium target.
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Inventors:
Hidenori Tomioka
Kenichi Kobayashi
Manabu Takahashi
Tatsuhiko Fujinuma
Kenichi Kobayashi
Manabu Takahashi
Tatsuhiko Fujinuma
Application Number:
JP7640593A
Publication Date:
September 22, 2003
Filing Date:
March 11, 1993
Export Citation:
Assignee:
Nippon Heavy Chemical Co., Ltd.
International Classes:
B22F3/14; C22C1/05; C22C1/10; C23C14/34; (IPC1-7): C22C1/05; B22F3/14; C22C1/10; C23C14/34
Domestic Patent References:
| JP63161101A | ||||
| JP62174373A | ||||
| JP4191366A |
Attorney, Agent or Firm:
Junzo Ogawa (1 person outside)
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