Title:
REACTIVE MATRIX AND METHOD FOR REMOVING IMPURITY FROM HYDRIDE AND INERT GAS
Document Type and Number:
Japanese Patent JP3387576
Kind Code:
B2
Abstract:
PURPOSE: To obtain a macro reticulate polymer suitable for refining materials, which has a particular structure and removes water vapor and oxidants from a gas without generating volatile by-product materials.
CONSTITUTION: A macro reticulate polymer has a structure of the formula (Ar is a heteroaromatic moiety, M is lithium, sodium, potassium, alkyl magnesium, alkyl zinc or dialkylaluminum; R is an organic moiety or amino moiety; R1 is a polymerized moiety forming the molecular backbone of the polymer). The macro reticulate polymer has, for example, heteroatom lateral groups or heteroatoms, and is obtained by reacting a polymer such as poly(4- vinylpyridine) with an orgnometallic compound.
Inventors:
James T Snow
Application Number:
JP24603093A
Publication Date:
March 17, 2003
Filing Date:
September 08, 1993
Export Citation:
Assignee:
Microlith Corporation
International Classes:
B01D53/02; B01D53/14; B01D53/28; B01J20/26; C08F8/42; C08F26/06; (IPC1-7): C08F26/06; B01D53/02; B01D53/14; B01D53/28
Attorney, Agent or Firm:
Motohiro Kurauchi (1 outside)
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