Title:
光増感化学増幅レジストで酸ショットノイズとして複製されるＥＵＶショットノイズの軽減
Document Type and Number:
Japanese Patent JP6636196
Kind Code:
B2
Abstract:
A method for mitigating shot noise in extreme ultraviolet (EUV) lithography and patterning of photo-sensitized chemically-amplified resist (PS-CAR) is described. The method includes a first EUV patterned exposure to generate a photosensitizer and a second flood exposure at a wavelength different than the wavelength of the first EUV patterned exposure, to generate acid in regions exposed during the first EUV patterned exposure, wherein the photosensitizer acts to amplify acid generation and improve contrast. The resist may be exposed to heat, liquid solvent, solvent atmosphere, or a vacuum to mitigate the effects of EUV shot noise on photosensitizer concentration which may accrue during the first EUV patterned exposure.
Inventors:
Kirkashi, Michael A
Somervell, Mark H
Somervell, Mark H
Application Number:
JP2019039323A
Publication Date:
January 29, 2020
Filing Date:
March 05, 2019
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G03F7/20; G03F7/38
Domestic Patent References:
| JP2015172741A | ||||
| JP200445513A | ||||
| JP201350671A | ||||
| JP2013235901A | ||||
| JP200243215A |
Foreign References:
| US20130084532 | ||||
| US7829269 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Shinsuke Onuki
Tadahiko Ito
Shinsuke Onuki