Title:
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK
Document Type and Number:
Japanese Patent JP2010122304
Kind Code:
A
Abstract:
To provide a reflective mask blank having uniform thickness and high flatness when mounted as a reflective mask on an electrostatic chuck of an exposure apparatus, and capable of achieving high pattern transfer accuracy.
The reflective mask blank comprises a substrate, a multilayer film formed on one surface of the substrate, an intermediate layer formed on the multilayer film, an absorption layer formed on the intermediate layer, and a conductive film formed on the other surface of the substrate, wherein the film thickness distribution of the conductive film is controlled to give uniform thickness of the reflective mask blank.
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Inventors:
ABE TSUKASA
AKIZUKI HIDEO
ADACHI TAKASHI
TAKIGAWA TADAHIKO
AKIZUKI HIDEO
ADACHI TAKASHI
TAKIGAWA TADAHIKO
Application Number:
JP2008293521A
Publication Date:
June 03, 2010
Filing Date:
November 17, 2008
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
G03F1/22; G03F1/24; H01L21/027
Domestic Patent References:
| JP2008027992A | 2008-02-07 | |||
| JP2002299228A | 2002-10-11 | |||
| JP2003014893A | 2003-01-15 | |||
| JP2003501823A | 2003-01-14 |
Attorney, Agent or Firm:
Akihiko Yamashita
Kishimoto Tatsuto
Kishimoto Tatsuto
Previous Patent: JP2010122303
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