Title:
REFLECTIVE MASK AND MANUFACTURING METHOD OF THE SAME
Document Type and Number:
Japanese Patent JP2012151368
Kind Code:
A
Abstract:
To provide a reflective mask, capable of obtaining a reflection signal having sufficient contrast even for a reflective mask for EUV exposure, when detecting an alignment mark using a laser drawing device, thus forming a resist pattern for forming a light-shielding region with good position accuracy, and to provide a manufacturing method of the same.
The above-mentioned problem is solved by configuring an alignment mark formed on a reflective mask with slit structures having a fine line width and a space less than the resolution limit for a wavelength of alignment light of a laser drawing device and reducing intensity of a reflection signal in alignment light irradiation.
Inventors:
ABE TSUKASA
OGASE TAICHI
INAZUKI YUICHI
OGASE TAICHI
INAZUKI YUICHI
Application Number:
JP2011010263A
Publication Date:
August 09, 2012
Filing Date:
January 20, 2011
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
H01L21/027; G03F1/22
Domestic Patent References:
| JP2003022961A | 2003-01-24 |
Foreign References:
| WO2009136564A1 | 2009-11-12 | |||
| WO2009122972A1 | 2009-10-08 | |||
| WO2009136564A1 | 2009-11-12 |
Attorney, Agent or Firm:
Satoshi Kanayama
Keiko Fukamachi
Hideo Ito
Hiromi Fujimasu
Naoki Goto
Yusuke Ito
Keiko Fukamachi
Hideo Ito
Hiromi Fujimasu
Naoki Goto
Yusuke Ito