Title:
反射型マスク、並びに反射型マスクブランク及び半導体装置の製造方法
Document Type and Number:
Japanese Patent JP7155316
Kind Code:
B2
Abstract:
To provide a manufacturing method of a reflection type mask blank for manufacturing a reflection type mask having a high contrast value.SOLUTION: There is provided a manufacturing method of a reflection type mask blank having a multilayer reflection film and an absorber film on a substrate in this order, including the processes of: obtaining a relationship between film thickness of the absorber film and reflection coefficient at a surface of the absorber film by simulation; calculating a first contrast value C1 from a reflection coefficient Rabs at the surface of the absorber film with a film thickness D0 and a reflection coefficient Rmulti at a surface of the multilayer reflection film or a surface of a protective film by removing the absorber film to expose the multilayer reflection film or the protective film; obtaining a film thickness d of a residual film layer and a total film thickness D=D1, where D0=D1-d, when a part of the absorber film in the thickness direction having a second contrast value C2, which is higher than the first contrast value C1, is removed and a film is left; and forming the absorber film so to have the total film thickness D.SELECTED DRAWING: Figure 5
Inventors:
Yohei Ikebe
Application Number:
JP2021043121A
Publication Date:
October 18, 2022
Filing Date:
March 17, 2021
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/24; H01L21/3065
Domestic Patent References:
| JP2006237192A | ||||
| JP2016126319A |
Attorney, Agent or Firm:
Patent Attorney Corporation Tsukuni
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