Title:
REGENERATION OF AMMONIACAL ETCHING SOLUTION FOR COPPER METAL ETCHING
Document Type and Number:
Japanese Patent JPS55148772
Kind Code:
A
Abstract:
Ammoniacal etching solutions used for etching metallic copper, such as in etching galvanized printed circuits, are regenerated by electrolytically contacting a spent etching solution with a metal, such as Al or Fe, more electronegative than copper and which, in the pH range of the etching solution, forms a relatively insoluble hydroxide so that Cu++-ions are reduced to metallic copper and the etching chemicals, NH3 and NH4+, are regenerated while substantially simultaneously the more electronegative metal is oxidized into a substantially insoluble hydroxide.
Inventors:
EFUCHIMIOSU KONSUTANTOUROSU
Application Number:
JP5704180A
Publication Date:
November 19, 1980
Filing Date:
April 28, 1980
Export Citation:
Assignee:
SIEMENS AG
International Classes:
C23F1/46; (IPC1-7): C23F1/00