Title:
REGENERATION METHOD FOR USED POLISHING AGENT AND MANUFACTURING METHOD FOR GLASS SUBSTRATE
Document Type and Number:
Japanese Patent JP2015066656
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a regeneration method for a used polishing agent, which can recover the polishing rate of a cerium system polishing agent used in polishing glass and suppress occurrence of a flaw on a surface of a glass substrate when the polishing agent is used again.SOLUTION: The regeneration method for a used polishing agent, which contains cerium used in polishing glass, performs acid treatment for contacting the used polishing agent with acidic solution including cation of an alkali metal or an alkali earth metal and inorganic acid exclusive of hydrofluoric acid.
Inventors:
IIZUMI KYOSUKE
Application Number:
JP2013205167A
Publication Date:
April 13, 2015
Filing Date:
September 30, 2013
Export Citation:
Assignee:
HOYA CORP
International Classes:
B24B57/02; B24B1/00; B24B7/24; B24B37/00; B24B37/20; C03C19/00; C09K3/14; G11B5/84
Attorney, Agent or Firm:
Global IP Tokyo Patent Business Corporation