Title:
RELEASE TREATMENT METHOD FOR NANOIMPRINT AND RELEASE FILM
Document Type and Number:
Japanese Patent JP2012248641
Kind Code:
A
Abstract:
To provide a release treatment method which has releasability comparable to that of an F-SAM conventionally used in nanoimprint lithography and is excellent in durability furthermore, and a release film formed by the method.
In a release treatment method, a polydimethylsiloxane (PDMS) thin film is used as a release film provided on a surface of a nanoimprint mold. The polydimethylsiloxane thin film is preferably deposited on the mold surface using a compound in which a silane coupling group is bonded to a terminal on one side of polydimethylsiloxane.
Inventors:
MATSUI SHINJI
OKADA MAKOTO
OKAMOTO TOSHIKI
OKADA MAKOTO
OKAMOTO TOSHIKI
Application Number:
JP2011118531A
Publication Date:
December 13, 2012
Filing Date:
May 26, 2011
Export Citation:
Assignee:
HYOGO PREFECTURE
MEISHO KIKO KK
MEISHO KIKO KK
International Classes:
H01L21/027; B29C33/42; B29C33/60; B29C33/68; B29C59/02; B81C99/00
Attorney, Agent or Firm:
Yoshio Hosomi
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