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Title:
レリーフ画像の製造方法
Document Type and Number:
Japanese Patent JP5155654
Kind Code:
B2
Abstract:
The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in another embodiment, the mask image is formed on a receptor sheet. The mask image is then transferred to a photosensitive material, such as a flexographic printing plate precursor. The resulting assembly is exposed to the curing radiation resulting in exposed and unexposed areas of the photosensitive material. The carrier sheet or the receptor sheet may be removed from the mask image either before or after exposure to the curing radiation. Finally, the photosensitive material and mask image assembly is developed with a suitable developer to form a relief image.

Inventors:
Ali, M.
Brown, david
Forencombe, Elsie
Heller, michael
Application Number:
JP2007507503A
Publication Date:
March 06, 2013
Filing Date:
April 06, 2005
Export Citation:
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Assignee:
Eastman Kodak Company
International Classes:
G03F7/20; B41C1/10; B41N1/12; G03F1/76; G03F1/88; G03F3/06; G03F7/00; G03F7/09; G03F7/095; G03F7/11; G03F7/38
Domestic Patent References:
JP49098225A
JP50001801A
JP54044904A
JP56041106B1
JP57198468A
JP59189341A
JP62003416B1
JP1118842A
JP2501427A
JP4026464B2
JP6332157A
JP7506201A
JP8305007A
JP10509254A
JP11157194A
JP11184062A
JP11153865A
JP2001110752A
JP2002273846A
JP2003270778A
Foreign References:
WO1994003839A1
US6013409
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi



 
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