Title:
REPLICA FOR FORMING TERMINAL PAD AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH1186219
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To produce a replica with a good dimensional precision and form a stable protective layer with no defect when forming a terminal pad by a replica method. SOLUTION: A photoresist layer 24 is disposed on a substrate 1 including a terminal portion 2 for an interconnect layer, and performing a first exposure and development process for the photoresist layer with an exposure amount sufficient for development through a photomask 25 for defining a bottom surface portion of a replica which has a larger outer size than a size of a top surface of the replica. A second exposure and development process for the photoresist layer is performed with an exposure amount substantially less than that required for completely removing the resist in usual development a photomask (26) for precisely defining the dimension of the top surface of the replica by focusing onto the upper surface of the photoresist layer. Thus, a replica 14 is formed to have side walls which are vertical at the top surface portion while tilted at blunt angles at the bottom surface portion. When covered by an alumina protective layer 15, generation of a crevice 15a or an abnormal layer 15b is suppressed at the minimum level.
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Inventors:
SHOJI SHIGERU
FUJIMOTO HIROKI
FUJIMOTO HIROKI
Application Number:
JP24733297A
Publication Date:
March 30, 1999
Filing Date:
September 11, 1997
Export Citation:
Assignee:
YAMAHA CORP
International Classes:
G11B5/31; (IPC1-7): G11B5/31
Attorney, Agent or Firm:
Shoichi Hase (3 outside)