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Patent Searching and Data


Title:
RESIN BASE MATERIAL SEPARATION AND RECOVERY METHOD, SUPPORT FOR IMAGE FORMING MATERIAL, RESIN CONTAINER AND IMAGE FORMING MATERIAL
Document Type and Number:
Japanese Patent JP2002301720
Kind Code:
A
Abstract:

To provide a low cost resin base material separation and recovery method capable of separating and recovering the resin base material of an image forming material using no developing treatment liquid, not lowering the purity of the resin base material in separation and recovery even if the image forming material exists in a state mixed with a silver halide photographic photosensitive material, capable of recovering the resin material without burning the same in consideration of global warming or environment, and also capable of also recovering other useful substance and not requiring large-scaled equipment.

In the resin base material separation and recovery method, a substance allowing physical force to act on an adherend is brought into contact with the resin base material having the adherend to destruct the adherend.


Inventors:
WADA YASUNORI
YAMAZAKI MASAHIKO
Application Number:
JP2001399082A
Publication Date:
October 15, 2002
Filing Date:
December 28, 2001
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
International Classes:
G03C11/24; B07B1/28; B07B4/08; B08B7/02; B29B17/02; B29B17/04; C22B1/00; B29K67/00; (IPC1-7): B29B17/02; B07B1/28; B07B4/08; B08B7/02; G03C11/24