PURPOSE: To laminate a film superior in sensitivity and the γ value and a film superior in dry etching resistance to form a resist film laminate by incorporating a mixture of a first component of a novolak resin and a second component of a fluoroalkyl acrylate polymer.
CONSTITUTION: When the surface of a substrate is coated with the mixture of the first component and the second component and baked, the mixture is separated into 2 layers in the baking step, and the resist film composed of the upper layer of the second component made of the fluoroalkyl acrylate polymer and the lower layer of the first component made of the novolak resin containing an aromatic constituent superior in oxygen dry etching resistance, thus permitting both of the resist layer superior in sensitivity and the γ value and the resist layer superior in dry etching resistance to be formed at the same time.
DEGUCHI TAKAYUKI
TAIRA KAZUO
HAMAGUCHI NAOYO
