PURPOSE: To enable to form a half-micron pattern even on a substrate having stages by allowing an alkyl compd. having Si atoms to react with polyhydroxy maleimide, and transforming 20-50% of OH groups of obtd. polymer to ether bonds by modification.
CONSTITUTION: An Si-modified polymer for constituting a base resin of an upper layer resist is prepd. from polyhydroxy maleimide as starting material by modifying with an alkyl compd. contg. Si atoms, for example, ethyl(polydimethyl siloxane)methylene chloride, wherein halogen atoms which combine with H atoms in OH groups of the starting polymer and eliminate the H atoms are contained in the alkyl compd. Thus, 20-50% of the OH groups is modified to ether bonds. By this method, a half micro pattern can be formed on a substrate even if stages are present on the substrate.
SHIBA SHOJI
WATABE KEIJI
NAMIKI TAKAHISA
YONEDA YASUHIRO
