Title:
RESIN-PHYLLOSILICATE COMPOSITE MATERIAL AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2002121397
Kind Code:
A
Abstract:
To provide a resin-phyllosilicate composite material with improved interfacial properties between a resin and a phyllosilicate and also improved performances.
The resin-phyllosilicate composite material comprises a crystalline resin and a phyllosilicate, and the average interlayer distance of the phyllosilicate to be detected by the X-ray diffraction measurement is ≥6 nm, and the composite material comprises 0.1-10 pts.wt., based on 100 pts. total of the crystalline resin and the phyllosilicate, sorbitol based crystallization nucleating agent.
Inventors:
IWASA KOICHIRO
UEDA NAOKI
SEN HIROYOSHI
UEDA NAOKI
SEN HIROYOSHI
Application Number:
JP2000314015A
Publication Date:
April 23, 2002
Filing Date:
October 13, 2000
Export Citation:
Assignee:
SEKISUI CHEMICAL CO LTD
International Classes:
C08J3/20; C08K3/34; C08K5/053; C08L93/04; C08L101/00; (IPC1-7): C08L101/00; C08J3/20; C08K3/34; C08K5/053; C08L93/04
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