Title:
レジスト用樹脂、化学増幅型レジスト組成物およびレジストパターン形成方法
Document Type and Number:
Japanese Patent JP4459327
Kind Code:
B2
Inventors:
Masayuki Fujiwara
Yukiya Wakisaka
Yukiya Wakisaka
Application Number:
JP19816599A
Publication Date:
April 28, 2010
Filing Date:
July 12, 1999
Export Citation:
Assignee:
Mitsubishi Rayon Co., Ltd.
International Classes:
C08F230/08; H01L21/027; C08F30/08; C08K5/16; C08K5/36; C08L43/04; G03F7/004; G03F7/033; G03F7/039; G03F7/075; G03F7/38
Domestic Patent References:
| JP2000026548A | ||||
| JP2001290272A |
Other References:
J.-B. Kim, H.-W. Kim, S.-H. Lee, S.-J. Choi, J. Moon, Jootae,`Chemically amplified resist based on the methacrylate polymer with 2-trimethylsilyl-2-propyl ester protecting group.',Proceedings of SPIE-The International Society for Optical Engineering (1999), 3678(Pt. 1, Advances in Resist Technology and Processing XVI),米国,SPIE-The International Society for Optical Engineering,1999年 8月10日,Vol.3678,pp.420-428