Title:
樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7284635
Kind Code:
B2
Abstract:
To provide a compound and a resist composition capable of producing a resist pattern having good CD uniformity.SOLUTION: A resin contains at least one selected from the group consisting of structural units represented by formula (IA) and formula (IB) and at least one selected from the group consisting of structural units represented by formula (a1-1) and formula (a1-2). Formula (IA): -(CH-C(R)-X-L(OH)(-OR)(-OR))-. Formula (IB): -(CH-C(R)-X-L(X-C(R)-CH)-)(-OR)(-OR))-. Formula (a1-1): -(CH-C(R)-CO-L- (optionally substituted adamantane). Formula (a1-2): -(CH-C(R)-CO-L- (optionally substituted cycloalkyl). [Xand Xeach represent -C(=O)O- or the like; Lrepresents a hydrocarbon group; Rand Rare bonded to each other to form a ring; and Land Leach represent -O- or the like.]SELECTED DRAWING: None
Inventors:
Masahiko Shimada
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2019097023A
Publication Date:
May 31, 2023
Filing Date:
May 23, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F220/26; C07D319/04; C08F220/18; C08K5/42; C08L27/12; C08L33/06; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2006152255A | ||||
| JP2017186540A | ||||
| JP2013100260A | ||||
| JP58225102A | ||||
| JP2015526426A | ||||
| JP8501108A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP