樹脂、レジスト組成物及びレジストパターンの製造方法

Japanese Patent JP7406339

B2

To provide a compound allowing manufacture of a resist pattern with good CD uniformity.SOLUTION: The invention provides a compound of formula (I) and a resist composition. [In the formula, Ris H or a methyl group; Lis an alkanediyl group; Ris H, or a group of the formula (1a) or (2a); R, Rand Rare each an alkyl group; naa is 0 or 1; Rand Rare each H or an alkyl group; Ris an alkyl group; Xis O or S; m3 is 2 or 3; Ris a halogen atom, an OH group, an alkyl group, or the like; and m4 is from 0 to 3.]SELECTED DRAWING: None

WO/1997/003039	DERIVATIVES OF AROMATIC CARBOXYLIC ACIDS FROM AROMATIC CARBOXYLIC ACID ANHYDRIDES AND HYDROXY(METH)ACRYLATES, AND COMPOSITIONS THAT CONTAIN THESE COMPOUNDS
JPH1060087	PHOTOPOLYMERIZABLE UNSATURATED COMPOUND CONTAINING CARBOXYLIC GROUP AND ALKALI-DEVELOPING TYPE PHOTOSENSITIVE RESIN COMPOSITION
JP6759577	Active energy ray-curable composition, active energy ray-curable ink, composition container, two-dimensional or three-dimensional image forming device, two-dimensional or three-dimensional image forming method, cured product, decorative body, and active energy. Linear polymerizable compound

Masahiko Shimada
Takahiro Yasue
Koji Ichikawa

JP2019190329A

December 27, 2023

October 17, 2019

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Sumitomo Chemical Co., Ltd.

C08F20/30; C08F220/30; G03F7/004; G03F7/039; G03F7/20

JP2001503040A
JP2020122083A
JP2007256347A
JP2018016792A
JP2017207532A
JP2013174660A

US20010051314

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