Title:
RESIN, RESIST COMPOSITION, AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2015042750
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a resin to be used for a resist composition for obtaining a favorable shape and focus margin.SOLUTION: The resin includes a structural unit derived from a compound expressed by formula (I), in which the structural unit is included by 5 to 10 mol% in the whole structural units of the resin. In formula (I), Rrepresents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom; and Xrepresents a heterocycle having 2 to 36 carbon atoms, in which a hydrogen atom included in the heterocycle may be replaced by a halogen atom, hydroxyl group, hydrocarbon group having 1 to 24 carbon atoms, alkoxy group having 1 to 12 carbon atoms, acyl group having 2 to 4 carbon atoms or acyloxy group having 2 to 4 carbon atoms, and -CH- included in the heterocycle may be replaced by -CO- or -O-.
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Inventors:
ICHIKAWA KOJI
KAMABUCHI AKIRA
KAMABUCHI AKIRA
Application Number:
JP2014192316A
Publication Date:
March 05, 2015
Filing Date:
September 22, 2014
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F246/00; G03F7/039; H01L21/027
Domestic Patent References:
| JP2006276851A | 2006-10-12 | |||
| JP2000503049A | 2000-03-14 | |||
| JP2002023371A | 2002-01-23 |
Foreign References:
| WO2011024953A1 | 2011-03-03 |
Attorney, Agent or Firm:
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