Title:
RESIST COMPOSITION CONTAINING LACTONE ADDITIVE
Document Type and Number:
Japanese Patent JP3503622
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition which is imaged with 193 nm radiation and developed to form a resist structure having high resolution and excellent etching resistance.
SOLUTION: The acid catalyst type positive type resist composition contains a combination of (a) an imaging polymer containing a monomer selected from the group comprising cycloolefins, acrylates and methacrylates, (b) a radiation sensitive acid generating agent and (c) a lactone additive. The lactone additive preferably contains at least 10 carbon atoms and more preferably contains at least one saturated alicyclic moiety. The imaging polymer is preferably a cycloolefin polymer.
Inventors:
Hiroshi Ito
Pushkar Lao Varanasi
Pushkar Lao Varanasi
Application Number:
JP2001238985A
Publication Date:
March 08, 2004
Filing Date:
August 07, 2001
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
C08F232/08; G03F7/004; G03F7/033; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; C08F232/08; G03F7/033; G03F7/039; H01L21/027
Domestic Patent References:
| JP200035664A | ||||
| JP2000112130A | ||||
| JP200066380A | ||||
| JP11327163A | ||||
| JP815865A | ||||
| JP616730A | ||||
| JP1010739A | ||||
| JP8262702A | ||||
| JP9221519A | ||||
| JP7199467A |
Attorney, Agent or Firm:
Hiroshi Sakaguchi (1 person outside)