PURPOSE: To prevent a shift in the position of a pattern due to the accumulation of negative charges at the time of exposure with electron beams by laminating an electrically conductive soluble polymer and an electron beam resist or mixing them.
CONSTITUTION: An electrically conductive soluble polymer and an electron beam resist are laminated and used or the resist is mixed with the polymer. The resist may be an acrylate polymer such as polymethyl methacrylate or a polyolefin sulfone polymer as a positive type resist or a polystyrene type polymer such as poly-p-vinylphenol or an epoxy-contg. polymer such as polyglycidyl methacrylate as a negative type resist. The electrically conductive soluble polymer is not especially limited if it can be mixed with the electron beam resist without causing separation. A shift in the position of a pattern due to the accumulation of electric charges can be prevented.
FUCHIGAMI HIROYUKI
TANAKA SACHIKO
KUMADA TERUHIKO
KUBOTA SHIGERU
HIZUKA YUJI
