To provide a compound suitable as an acid generator for resist composition, an acid generator made from the compound, a resist composition including the acid generator, and a method for forming a resist pattern using the resist composition.
The present invention relates to an acid generator comprising a compound expressed by the general formula (b1), and a resist composition comprises: a base component whose solubility in an alkali developing solution changes by an action of acid; and the acid generator component generating acid by light exposure that is a compound expressed by the formula (b1). In the formula, R1 represents a hydrogen atom, a linear, a branched or a cyclic alkyl group having 1 to 10 carbon atoms or heterocyclic group; R2 represents a linear or a branched alkyl group having 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and X- represents an anion.
UTSUMI YOSHIYUKI
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
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