RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND

Japanese Patent JP2014021286

A

To provide a compound useful for a resist composition, a resist composition containing the compound, and a method for forming a resist pattern by using the resist composition.

The resist composition comprises a base component (A) showing changes in the solubility with a developing solution by an action of an acid and a compound (D0) expressed by general formula (d0-1). The method for forming a resist pattern is carried out by using the composition. In the formula, Y¹ represents a single bond or a divalent connecting group; V¹ represents a single bond or a divalent cyclic group optionally having a substituent; R¹ represents a monovalent group expressed by formula (r-d0) (where * represents a coupling bond); R² represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms optionally having a substituent; n is 0 or 1, and when n is 0, V¹ is not a single bond; m is an integer of 1 or more; and M^m+ represents an organic cation having a valence of m.

KAWAKAMI AKINARI
UTSUMI YOSHIYUKI
MOTOIKE NAOTO

JP2012160049A

February 03, 2014

July 18, 2012

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TOKYO OHKA KOGYO CO LTD

G03F7/004; C07C25/18; C07C381/12; C07D307/33; C08F220/28; C09K3/00; G03F7/039; H01L21/027; C07C309/12

JP2012053336A	2012-03-15
JP2013125146A	2013-06-24
JP2012098390A	2012-05-24
JP2013205837A	2013-10-07
JP2011118123A	2011-06-16
JP2012053336A	2012-03-15
JP2013125146A	2013-06-24
JP2012098390A	2012-05-24
JP2013205837A	2013-10-07

WO2012053527A1	2012-04-26
WO2012049919A1	2012-04-19
US20120129104A1	2012-05-24
WO2012053527A1	2012-04-26
WO2012049919A1	2012-04-19
US20120129104A1	2012-05-24

Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi

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