Title:
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2021081702
Kind Code:
A
Abstract:
To provide a resist composition which achieves higher sensitivity and is excellent in lithographic characteristics, and a resist pattern forming method using the resist composition.SOLUTION: The resin composition contains an onium salt-based acid generator component (B) and a compound (D0) represented by the following general formula (d0) and comprising an anionic moiety and a cationic moiety. A cationic moiety of at least one of the onium salt-based acid generator component (B) and the compound (D0) is a cation having an electron-withdrawing group. In the formula (d0), Mm+ represents an m-valent organic cation; Rd0 represents a substituent; and n represents an integer of 2 or more.SELECTED DRAWING: None
Inventors:
KOJIMA TAKAHIRO
YAHAGI MASATO
YAHAGI MASATO
Application Number:
JP2020109820A
Publication Date:
May 27, 2021
Filing Date:
June 25, 2020
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/004; C07C65/03; C07C381/12; C09K3/00; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Sumio Tanai
Matsumoto
Ryu Miyamoto
Masato Iida
Matsumoto
Ryu Miyamoto
Masato Iida