Title:
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2022066864
Kind Code:
A
Abstract:
To provide a resist composition excellent in all of sensitivity, resolution, roughness reduction, and pattern shape, and a resist pattern forming method using the resist composition.SOLUTION: The resist composition contains: a resin component (A1) having a constituent unit (a01) derived from a compound represented by general formula (a0-1); and a compound (D0) represented by general formula (d0). In the formulae, W01 represents a polymerizable group-containing group; Ya01 represents a single bond or the like; Rx01 represents an acid-dissociable group; Mm+ represents an m-valent organic cation; and Rd0 represents a substituent.SELECTED DRAWING: None
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Inventors:
YAHAGI MASATO
MATSUMIYA YU
SUZUKI YOSUKE
IWASAWA YUTA
KOJIMA TAKAHIRO
ONISHI KOSHI
MATSUMIYA YU
SUZUKI YOSUKE
IWASAWA YUTA
KOJIMA TAKAHIRO
ONISHI KOSHI
Application Number:
JP2020175441A
Publication Date:
May 02, 2022
Filing Date:
October 19, 2020
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/004; C07C65/03; C07C65/10; C07C381/12; C08F12/02; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida