Title:
RESIST COMPOSITION AND PATTERN FORMING PROCESS
Document Type and Number:
Japanese Patent JP2021135497
Kind Code:
A
Abstract:
To provide a resist material having high sensitivity and small LWR and CDU regardless of whether it is a positive resist material or a negative one, and a pattern forming process using the same.SOLUTION: A resist composition comprises a quencher containing a sulfonium salt having the formula (A).SELECTED DRAWING: None
Inventors:
HATAKEYAMA JUN
WATANABE ASAMI
WATANABE ASAMI
Application Number:
JP2021009239A
Publication Date:
September 13, 2021
Filing Date:
January 25, 2021
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/004; C07C53/21; C07C61/135; C07C63/68; C07C65/10; C07C381/12; C07D333/76; C08F20/10; C09K3/00; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Hideaki International Patent Office