レジスト組成物及びレジストパターンの製造方法

Title:

レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP7178169

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having a good pattern collapse margin (PCM).SOLUTION: The resist composition contains a non-polymerizable compound having a 1,2-naphthoquinone diazide sulfonyl group in the molecule, a resin containing a structural unit having an acid-labile group, and an acid generator. The non-polymerizable compound having the 1,2-naphthoquinone diazide sulfonyl group in the molecule preferably has a molecular weight of 2,000 or less when the 1,2-naphthoquinone diazide sulfonyl group is a hydrogen atom.SELECTED DRAWING: None

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Inventors:

Yuko Mukai
Tatsuro Masuyama
Koji Ichikawa

Application Number:

JP2017234591A

Publication Date:

November 25, 2022

Filing Date:

December 06, 2017

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

C07C309/76; G03F7/004; C07D211/46; C07D215/58; C07D233/60; C07D295/088; C07D307/00; C07D317/72; C07D321/10; C07D327/06; C07D327/08; C07D333/46; C07D335/02; G03F7/039; G03F7/20

Domestic Patent References:

JP2004157199A

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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