Title:
レジスト組成物、およびレジストパターン形成方法
Document Type and Number:
Japanese Patent JP5781755
Kind Code:
B2
Abstract:
A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): wherein RN represents a nitrogen-containing heterocyclic group which may have a substituent; X0 represents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20 carbon having a cyclic partial structure, or any one of these groups in which some or all of the hydrogen atoms thereof have been substituted with fluorine atoms; and M+ represents an organic cation.
Inventors:
Yoshiyuki Utsumi
Kenichiro Miyashita
Akira Kawakami
Kenichiro Miyashita
Akira Kawakami
Application Number:
JP2010273831A
Publication Date:
September 24, 2015
Filing Date:
December 08, 2010
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/039
Domestic Patent References:
| JP2012013807A | ||||
| JP2009209128A |
Foreign References:
| WO2010061977A1 |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida
Masatake Shiga
Matsumoto
Ryu Miyamoto
Masato Iida