Title:
レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7054654
Kind Code:
B2
Abstract:
The purpose of the present invention is to provide a resist composition which has excellent critical dimension uniformity (CDU) and can form a resist pattern with a good shape, and a resist pattern forming method using the concerned resist composition. The resist composition comprises: a base material component (A) of which solubility with respect to a developing solution is changed by the action of an acid; and an amine compound (D0) which is represented by general formula (d0), a carboxylic acid compound (E0) represented by general formula (e0) or a salt thereof. In formula (d0), R^d01, R^d02 and R^d03 each independently indicate an aliphatic hydrocarbon group which may have a substituent. In formula (e0), R^e01 indicates an aliphatic hydrocarbon group having a fluorine atom. Y^e01 indicates a divalent linking group or a single bond.
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Inventors:
Junichi Tsuchiya
Masashi Fujisaki
Masashi Fujisaki
Application Number:
JP2018123728A
Publication Date:
April 14, 2022
Filing Date:
June 28, 2018
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/20; G03F7/32
Domestic Patent References:
| JP10020501A | ||||
| JP2002072482A | ||||
| JP2017120367A |
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida