Title:
レジスト組成物及びレジストパターン形成方法、並びに、化合物及び酸発生剤
Document Type and Number:
Japanese Patent JP7109178
Kind Code:
B2
Abstract:
To provide a new compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition comprising the acid generator, and a method for forming a resist pattern using the resist composition.SOLUTION: A resist composition contains a resin component containing a constitutional unit having a hydroxystyrene skeleton, and a composition represented by general formula (b1). In the formula (b1), R01-R014 independently represent an optionally substituted hydrocarbon group or a hydrogen atom, or two or more of them may be bound to each other to form a ring structure. At least one of R01-R014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n. n is an integer of 1 or greater. m is an integer of 1 or greater. Mm+ is an organic cation having a valency of m.SELECTED DRAWING: None
Inventors:
Masatoshi Arai
Takaya Maebashi
Takuya Ikeda
Takaya Maebashi
Takuya Ikeda
Application Number:
JP2017225206A
Publication Date:
July 29, 2022
Filing Date:
November 22, 2017
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C07D327/04; G03F7/039; G03F7/20
Domestic Patent References:
| JP2018028574A | ||||
| JP2017102267A |
Foreign References:
| WO2017179727A1 |
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida