Title:
レジスト組成物、レジストパターン形成方法、及び化合物
Document Type and Number:
Japanese Patent JP7206102
Kind Code:
B2
Abstract:
Provided is a resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, Mm+ represents an m-valent organic cation. Rd0 represents a substituent. p represents an integer of 0 to 3. q represents an integer of 0 to 3. n represents an integer of 2 or greater. Here, a relationship of "n+p ≤ (q*2)+5" is satisfied.
Inventors:
Nguyen Cantin
Mari Murata
Masatoshi Arai
Nobuhiro Dobayashi
Mari Murata
Masatoshi Arai
Nobuhiro Dobayashi
Application Number:
JP2018228559A
Publication Date:
January 17, 2023
Filing Date:
December 05, 2018
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C07C65/05; C07C65/11; C07D333/54; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013200560A | ||||
| JP2018097125A |
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Previous Patent: Polyisocyanate composition, coating composition and coating film
Next Patent: CONTAINER REVERSAL DEVICE FOR GARBAGE TRUCK
Next Patent: CONTAINER REVERSAL DEVICE FOR GARBAGE TRUCK