Title:
レジスト組成物及びレジストパターン製造方法
Document Type and Number:
Japanese Patent JP6816983
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition which makes it possible to produce a resist pattern without residue and with excellent CD uniformity (CDU).SOLUTION: A resist composition comprises a resin (A1) comprising a structural unit having a -SO- group, a structural unit represented by formula (a4-0) and a structural unit having an acid-labile group, and an acid generator [in formula (a4-0), Ris a hydrogen atom or a methyl group. Lis a single bond or a C1-C4 aliphatic saturated hydrocarbon group. Lis a C1-C8 perfluoroalkanediyl group or a C 3-C8 perfluorocycloalkanediyl group. Ris a hydrogen atom or a fluorine atom].SELECTED DRAWING: None
Inventors:
Takayuki Miyagawa
Masashi Yoshida
Koji Ichikawa
Masashi Yoshida
Koji Ichikawa
Application Number:
JP2016133971A
Publication Date:
January 20, 2021
Filing Date:
July 06, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/038; C08F220/18; C08F220/38; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013519765A | ||||
| JP2010204187A | ||||
| JP2014026179A |
Foreign References:
| WO2009057484A1 | ||||
| WO2012133595A1 | ||||
| US20030022100 | ||||
| WO2015146443A1 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation