Title:
RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2011121938
Kind Code:
A
Abstract:
To form a resist pattern of excellent resolution and an excellent shape.
There is disclosed a salt represented by formula (I). In formula (I), Q1 and Q2 each independently represent a fluorine atom, or a 1C-6C perfluoroalkyl group; L1 represents a divalent 1C-17C saturated hydrocarbon group that may contain a substituent, provided that -CH2- contained therein may be substituted with -O-, or -CO-; R1 represents a 1-6C alkyl group comprising a fluorine atom; and Z+ represents an organic cation.
Inventors:
ICHIKAWA KOJI
SUGIHARA MASAKO
MASUYAMA TATSURO
SUGIHARA MASAKO
MASUYAMA TATSURO
Application Number:
JP2010242478A
Publication Date:
June 23, 2011
Filing Date:
October 28, 2010
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C311/09; C07C25/00; C07C381/12; C08F220/10; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2007206639A | 2007-08-16 | |||
| JP2008116703A | 2008-05-22 | |||
| JP2007145803A | 2007-06-14 | |||
| JP2004210670A | 2004-07-29 | |||
| JP2006504785A | 2006-02-09 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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