Title:
レジスト組成物
Document Type and Number:
Japanese Patent JP6748495
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having good line edge roughness (LER) can be produced without generating a residue.SOLUTION: The resist composition comprises: a resin (A1) containing a structural unit represented by formula (a4-0) and a structural unit having an acid-labile group; and an acid generator. A content percentage of the structural unit represented by formula (a4-0) is 0.5 mol% or more and 9.5 mol% or less with respect to the total of all structural units of the resin (A1). In the formula, Rrepresents a hydrogen atom or a methyl group; Lrepresents a single bond or an aliphatic saturated hydrocarbon group having 1 to 4 carbon atoms; and Lrepresents a perfluoroalkane diyl group having 1 to 8 carbon atoms or a perfluorocycloalkane diyl group having 3 to 12 carbon atoms.SELECTED DRAWING: None
Inventors:
Yuichi Mukai
Takahiro Yasue
Koji Ichikawa
Takahiro Yasue
Koji Ichikawa
Application Number:
JP2016130180A
Publication Date:
September 02, 2020
Filing Date:
June 30, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/038; C08F246/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2012098433A | ||||
| JP2012177807A | ||||
| JP2003015297A | ||||
| JP2012113003A | ||||
| JP2007204385A |
Foreign References:
| WO2012133595A1 | ||||
| WO2013141265A1 | ||||
| US20030228537 | ||||
| KR1020150046613A | ||||
| KR1020090049204A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation