Title:
RESIST LAMINATED BODY AND PATTERN FORMING METHOD USING SAME
Document Type and Number:
Japanese Patent JP3053072
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a resist laminated body including an antireflection film and capable of forming a high faithfulness pattern excellent in cross-sectional shape and to form a pattern with the resist laminated body.
SOLUTION: A negative type resist film contg. an acid generating agent made of an oxime sulfonate compd. is formed on an antireflection film formed on a substrate to produce the objective resist laminated body. The negative type resist film of this laminated body is selectively irradiated with active rays, heated and developed to form a negative type resist pattern on the antireflection film and dry etching is carried out through the resist pattern as a mask to form the objective pattern on the substrate.
Inventors:
Mitsuru Sato
Katsumi Ohmori
Etsuko Iguchi
Kiyoshi Ishikawa
Fumitake Kaneko
Toshimasa Nakayama
Katsumi Ohmori
Etsuko Iguchi
Kiyoshi Ishikawa
Fumitake Kaneko
Toshimasa Nakayama
Application Number:
JP23959096A
Publication Date:
June 19, 2000
Filing Date:
September 10, 1996
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/038; G03F7/09; G03F7/11; H01L21/027; H01L21/302; H01L21/3065; (IPC1-7): G03F7/004; G03F7/004; G03F7/038; G03F7/11; H01L21/027; H01L21/3065
Domestic Patent References:
| JP6118631A | ||||
| JP887115A | ||||
| JP7247401A | ||||
| JP667433A | ||||
| JP2154266A | ||||
| JP4340966A | ||||
| JP527421A | ||||
| JP5134411A | ||||
| JP5232702A |
Attorney, Agent or Firm:
Agata Akira (1 person outside)