Title:
RESIST MATERIAL AND METHOD FOR FORMING PATTERN
Document Type and Number:
Japanese Patent JP3952135
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist material, having superior transmittance for vacuum UV rays, resistance against decrease in the solubility of the resist (like a negative resist) and durability against dry etching and showing small surface roughness after etching, and to provide a method for forming a pattern by using the resist material.
SOLUTION: The resist material for exposure to high energy rays at ≤180 nm wavelength contains (a) a polymer compound as the base resin, containing a repeating unit having a cycloaliphatic hydrocarbon part as the main chain and having a carboxylate part which decomposes under acidic conditions, to produce a carboxylic acid and which is coupled to the main chain via 1 to 20 carbon atoms, (b) an acid producing agent and (c) an organic solvent. The resist material used for the method for forming a pattern reacts is sensitive to high energy rays and is superior in sensitivity at ≤180 nm wavelength, particularly for ≤160 nm, resolution and durability against plasma etching. Further, the resist material can be used as a resist material, especially for exposure wavelength of F2 excimer laser because of the above characteristics and can form a fine pattern, having a perpendicular cross section with respect to the substrate. Thereby, the material is suitable for the method for forming fine patterns for the manufacture of ultra LSIs.
Inventors:
Jun Hatakeyama
Yuji Harada
Jun Watanabe
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Mitsutaka Otani
Satoru Miyazawa
Kentaro Tsutsumi
Kazuhiko Maeda
Yuji Harada
Jun Watanabe
Yoshio Kawai
Masako Sasako
Masataka Endo
Kishimura Shinji
Mitsutaka Otani
Satoru Miyazawa
Kentaro Tsutsumi
Kazuhiko Maeda
Application Number:
JP2001266752A
Publication Date:
August 01, 2007
Filing Date:
September 04, 2001
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.
Matsushita Electric Industrial Co., Ltd
Central Glass Co., Ltd.
International Classes:
G03F7/039; C08F232/00; C08G61/08; H01L21/027; (IPC1-7): G03F7/039; C08F232/00; C08G61/08; H01L21/027
Domestic Patent References:
| JP11130844A | ||||
| JP11295892A | ||||
| JP2000109525A | ||||
| JP2000098615A | ||||
| JP2001125271A | ||||
| JP2001188346A | ||||
| JP2001302726A | ||||
| JP11265067A | ||||
| JP10254140A | ||||
| JP2000109545A | ||||
| JP2000066396A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa
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