Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4650644
Kind Code:
B2
Abstract:
A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.

More Like This:
JP4996667Sensitive and chemically amplified photoresists used in photomask processing and semiconductor processing
JP3682437ELECTRON BEAM SENSITIVE RESIST COMPOSITION AND METHOD FOR MANUFACTURING STAMPER BY USING THE SAME
JPH0651790INDUSTRIAL APPLICABILITY The title of the invention is an iodonium salt polymer, a method for producing the same, and a thermosetting composition.
Inventors:
Yuji Harada
Jun Hatakeyama
Maeda Kazunori
Koji Hasegawa
Satoshi
Application Number:
JP2008124476A
Publication Date:
March 16, 2011
Filing Date:
May 12, 2008
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039
Domestic Patent References:
JP2007304537A
JP2007204385A
JP2007187887A
JP2007025634A
JP2006309245A
JP2005206587A
Foreign References:
US20080090172
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa



 
Previous Patent: ラジアル異方性リング磁石の製造方法

Next Patent: インクジェット記録装置