Title:
レジスト材料及びこれを用いたパターン形成方法
Document Type and Number:
Japanese Patent JP6544248
Kind Code:
B2
Abstract:
To a resist composition comprising a polymer comprising recurring units having an acid labile group and an acid generator is added a metal-acid complex. The metal is Ce, Cu, Zn, Fe, In, Y, Yb, Sn, Tm, Sc, Ni, Nd, Hf, Zr, Ti, La, Ag, Ba, Ho, Tb, Lu, Eu, Dy, Gd, Rb, Sr or Cs. The acid is a fluoroalkylsulfonic acid, fluorinated arylsulfonic acid, fluorinated tetraphenylboric acid, fluoroalkylsulfonimidic acid or fluoroalkylsulfonemethide acid. Due to a high contrast of alkaline dissolution rate before and after exposure, high resolution, high sensitivity, and controlled acid diffusion rate, the composition forms a pattern with satisfactory profile and minimal line edge roughness.
Inventors:
Jun Hatakeyama
Application Number:
JP2016007219A
Publication Date:
July 17, 2019
Filing Date:
January 18, 2016
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C08F246/00; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013210609A | ||||
| JP2015172727A |
Attorney, Agent or Firm:
Hideaki International Patent Office