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Title:
レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP6769414
Kind Code:
B2
Abstract:
A resist composition comprising a 2,5,8,9-teraaza-1-phosphabicyclo[3.3.3]undocane, biguanide or phosphazene salt of an iodinated aromatic group-containing carboxylic acid exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.

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Inventors:
Jun Hatakeyama
Masaki Ohashi
Application Number:
JP2017169148A
Publication Date:
October 14, 2020
Filing Date:
September 04, 2017
Export Citation:
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Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C07C279/26; C07D279/12; C07D295/215; C07F9/24; C07F9/6584; C08F212/02; C08F220/26; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
JP9278738A
JP2013083957A
JP2010061087A
JP2013145256A
Foreign References:
WO2014208632A1
KR1020130083856A
Attorney, Agent or Firm:
Hideaki International Patent Office



 
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