Title:
レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP7067081
Kind Code:
B2
Abstract:
A resist composition comprising a base polymer and a quencher in the form of an iodonium salt of fluorinated aminobenzoic acid, fluorinated nitrobenzoic acid or fluorinated hydroxybenzoic acid offers a high dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
Inventors:
Jun Hatakeyama
Masaki Ohashi
Masaki Ohashi
Application Number:
JP2018009304A
Publication Date:
May 16, 2022
Filing Date:
January 24, 2018
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; C07C25/02; C07C25/13; C07C229/60; C07D295/155; C07D307/00; C07D327/08; C07D333/46; C07D333/76; C07D335/12; C07D339/08; C07J9/00; C08F20/12; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2019168475A | ||||
| JP2004077983A |
Foreign References:
| US20120045719 |
Attorney, Agent or Firm:
Hideaki International Patent Office
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